We develop high-refractive index materials for optical applications. Most materials are imprintable.
Refractive index of most polymers is around n = 1.5 and materials with a refractive index above n = 1.60 are considered as “high refractive index” materials. Our proprietary materials provide outstanding optical properties including a high index of refraction ranges between n = 1.75 and n = 2.05 (@ 590 nm) and high optical transparency. Our materials can be deposited as films, and most of them can be nanoimprinted with excellent pattern transfer fidelity with a high-resolution. Applications are many including: printable photonic devices, waveguides, photonic crystals, micro lenses, anti-reflective coating and much more.
Unique Features:
- High Refractive Index
- High Transparency in the visible to near-IR region
- High resolution nanoimprinting
- UV curable organic polymer with the highest refractive index ever reported
Hybrid Inorganic-Organic Material:
| Material | Refractive index (at 590 nm) | Transparency (%) (at 400 nm) | Maximum crack-free film thickness (nm) | Patterning | Anealing* Temperature (°C) | Shrinkage (after annealing) |
|---|---|---|---|---|---|---|
| CP1 | 2.05 | >90% (150nm thick film) | 150 | UV-NIL | 400 | 80% |
| CP2 | 1.85 | >90% (500nm thick film) | 500 | Reverse NIL | 180 | 40% |
* Requires annealing at this temperature to reach the specified refractive index
- G. Calafiore, et.al. “Printable photonic crystals with high refractive index for applications in visible light”, Nanotechnology 27, 1153031 (2016)
- C. Pina-Hernandez, et.al. “Printable planar lightwave circuits with a high refractive index”, Nanotechnology, 25 325302 (2014). (JOURNAL COVER)
- C. Pina-Hernandez, et.al. “A Route for Fabricating Printable Photonic Devices with Sub-10 nm Resolution”, Nanotechnology, 24, 065301 (2013).
Organic Polymers:
| Material | Refractive index (at 590 nm) | Transparency (%) (at 400 nm) | Maximum crack-free film thickness (nm) | Patterning | Anealing Temperature (°C) | Shrinkage (after annealing) |
|---|---|---|---|---|---|---|
| CP5 | 1.80 | >90% (1um thick film) | >10000 | Thermal NIL (100°C) | N/A | N/A |
| CP5-UV | 1.78 | >90% (1um thick film) | >10000 | UV-NIL | N/A | N/A |
- C. Pina-Hernandez, et.al. “Nanoimprinted High-Refractive Index Active Photonic Nanostructures Based on Quantum Dots for Visible Light” (under review 2017)
- A. Koshelev, et.al. “High refractive index Fresnel lens on a fiber fabricated by nanoimprint lithography for immersion applications”, Optics Letters 41 (15), 3423-3426 (2016)